Alan Colli
Senior Researcher, NanotechnologyCambridge, UK
Background
I have been with Nokia Research Centre since June 2007. I am now working in Nano Sensing team in Cambridge UK. We are interested in various future Nanosening solutions for mobile phones.
Publications
A. Colli, A. Fasoli, S. Pisana, Y. Fu, P. Beecher, W. I. Milne, A. C. Ferrari, “Nanowire Lithography on Silicon”, Nano Letters 8, 1358 (2008) [Research highlights in Nature 452, 916 (2008)]
A. Colli, A. Fasoli, C. Ronning, S. Pisana, S. Piscanec, A. C. Ferrari, "Ion beam doping of silicon nanowires", Nano Letters 8, 2188 (2008)
Y. Q. Fu, A. Colli, A. Fasoli, J. K. Luo, A. J. Flewitt, A. C. Ferrari, W. I. Milne, "Deep reactive ion etching as a tool for nanostructure fabrication", J. Vac. Sci. Technol. B 27, 1520 (2009)
A. Colli, A. Tahraoui, A. Fasoli, J. Kivioja, A. C. Ferrari, "Dual-gate silicon nanowire transistors in a single fabrication step", ACS Nano 3, 1587 (2009)
H. Zhou, A. Colli, A. Ahnood, Y. Yang, N. Rupesinghe, T. Butler, I. Haneef, P. Hiralal, A. Nathan, G. A. J. Amaratunga, "Arrays of Parallel Connected Coaxial Multiwall-Carbon-Nanotube-Amorphous-Silicon Solar Cells" (Invited paper), Adv. Mater. 21, 3919 (2009)
